ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,383, issued on July 14, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Lithography focus control metho... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,384, issued on July 14, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Photoresist composition" was in... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,385, issued on July 14, was assigned to Samsung Display Co. Ltd. (Yongin-si, South Korea) and LTC Co. Ltd (Hwaseong-si, South Korea). "Phot... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,386, issued on July 14, was assigned to RESONAC Corp. (Tokyo). "Photosensitive resin composition, dry film, printed wiring board, and metho... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,387, issued on July 14, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea). "Photoresist compositions for EUV and methods... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,388, issued on July 14, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo). "Positive resist composition and pattern forming process" was ... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,389, issued on July 14, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "EUV resist underlayer film-forming composition" was invented by Sho... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,390, issued on July 14, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany). "Component of an optical system" was invented by Matthia... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,392, issued on July 14, was assigned to National Cheng Kung University (Tainan, Taiwan). "Cyclic exposure scanning system having distribute... Read More
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,393, issued on July 14, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "System and method for conditioning optical apparat... Read More